Wafer processing method

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United States of America Patent

PATENT NO 9887091
SERIAL NO

14704605

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of processing a wafer includes: a grinding step of grinding a back surface of the wafer to form, on the back side of the wafer, a recess corresponding to a device region and an annular projecting portion corresponding to a peripheral marginal region; and a splitting groove forming step of forming, after the grinding step is conducted, a splitting groove for splitting the device region and the peripheral marginal region from each other at the boundary between the recess and the annular projecting portion, the splitting groove extending from the front surface of the wafer to reach the back surface of the wafer. The splitting groove is formed by dry etching.

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Patent Owner(s)

Patent OwnerAddress
DISCO CORPORATION13-11 OMORI-KITA 2-CHOME OTA-KU TOKYO 143-8580

International Classification(s)

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  • 2015 Application Filing Year
  • B24B Class
  • 630 Applications Filed
  • 508 Patents Issued To-Date
  • 80.64 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Suzuki, Katsuhiko Tokyo, JP 88 905

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Patent Citation Ranking

  • 2 Citation Count
  • B24B Class
  • 37.85 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges35253732521101 - 1011 - 2021 - 3031 - 4041 - 5051 - 600255075100125150175200225250275300325350375400425450475500525550575

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