Phase shift mask, method for manufacturing the same, and method for forming micro pattern
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United States of America Patent
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Feb 6, 2018
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N/A
app pub date -
Apr 20, 2015
filing date -
Dec 10, 2014
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Abstract
A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.
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