Length artifact and method of measurement
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 6, 2018
Issued Date -
N/A
app pub date -
Mar 28, 2017
filing date -
Jun 10, 2014
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A length artifact has a first side wall, a second side wall, and a base portion, the first side wall and the second side wall separated by an air gap at least four millimeters wide, the base portion being attached to a bottom of the first side wall and the second side wall, the base portion further having a first platform region that includes a first nest and a second platform region that includes a second nest, the first nest and the second nest configured to accept a spherical surface of a retroreflector target.
First Claim
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International Classification(s)
Cited Art Landscape
Patent Citation Ranking
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- G01S Class
- 0 % this patent is cited more than
- 7 Age
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|---|---|---|---|---|
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