Plasma treatment apparatus and plasma treatment method
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United States of America Patent
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Feb 6, 2018
Issued Date -
N/A
app pub date -
Nov 29, 2012
filing date -
Dec 7, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
A plasma treatment apparatus that includes a chamber having an opening portion which serves as a plasma ejection port surrounded by a dielectric member; a gas supply pipe that introduces gas into an inside of the chamber; a solenoid coil disposed in a vicinity of the chamber; a high-frequency power supply having a pulse modulation function which is connected to the solenoid coil; and a base material mounting table disposed on a plasma ejection port side. Plasma can be stably generated using the plasma treatment apparatus.
First Claim
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| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| JP | B2 | JP5510437 | Dec 07, 2011 |
| CN | B | CN103151234 | Dec 05, 2012 |
International Classification(s)
- 2012 Application Filing Year
- C23C Class
- 1946 Applications Filed
- 1591 Patents Issued To-Date
- 81.76 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C23C Class
- 0 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Aug 6, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Aug 6, 2029 |
