Hydroxylated-fullerene-containing solution, resin molding and resin composition each using the same, and method for producing each of the resin molding and the resin composition

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United States of America Patent

PATENT NO 9884955
SERIAL NO

14692951

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Abstract

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A hydroxylated-fullerene-containing solution in which a hydroxylated fullerene is evenly nano-dispersed in a solvent removable at low temperature in a subsequent step is provided. The hydroxylated-fullerene-containing solution includes a continuous phase including a mixed solvent consisting essentially of tetrahydrofuran and water or including melted phenol, and at least one of a hydroxylated fullerene and a hydroxylated fullerene derivative that is dispersed as a dispersed phase in the continuous phase, wherein the number-standard average particle diameter of particles in the dispersed phase is 50 nm or less. This solution is applied onto a surface of a resin molding, and then tetrahydrofuran and water, as the mixed solvent, are removed to form a hydroxylated fullerene layer on the surface of the resin molding. Alternatively, this solution is mingled with a resin, and then the mixed solvent is removed to produce a hydroxylated-fullerene-containing resin composition.

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Patent OwnerAddress
TOTAI CO LTDJAPAN TOKYO TAITUNG DISTRICT UENO 5 CHOME 24 NO 17 TOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harada, Akio Kyoto, JP 63 715
Kasai, Juichi Tokyo, JP 21 377
Kokubo, Ken Suita, JP 7 13
Noguchi, Takeshi Yufu, JP 77 995

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