Polishing pad and method for making the same
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United States of America Patent
Stats
-
Feb 6, 2018
Issued Date -
N/A
app pub date -
Oct 1, 2015
filing date -
Jan 12, 2015
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.
First Claim
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International Classification(s)
- 2015 Application Filing Year
- B24B Class
- 630 Applications Filed
- 508 Patents Issued To-Date
- 80.64 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- B24B Class
- 0 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Aug 6, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Aug 6, 2029 |
