Thin oxide formation by wet chemical oxidation of semiconductor surface when the one component of the oxide is water soluble
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United States of America Patent
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-
Jan 30, 2018
Issued Date -
N/A
app pub date -
Oct 1, 2015
filing date -
May 30, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A semiconductor device is provided, which comprises a semiconductor structure having a surface, the semiconductor structure comprising a material whose oxide is water soluble; and an oxide layer formed on the surface of the semiconductor structure by a wet chemical oxidation treatment utilizing a solvent mixture that comprises a water soluble substance and an aprotic solvent. The layer of oxide may be as thin as approximately 0.7 nanometers in width or less. The semiconductor structure comprises at least one of Ge, SiGe, and III-V compound semiconductor materials. A solution mixture for oxidizing selective semiconductor materials is also provided, which comprises a solvent mixture that includes: a water soluble oxidizing agent; and an aprotic solvent.
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International Classification(s)
- 2015 Application Filing Year
- H01L Class
- 25498 Applications Filed
- 22451 Patents Issued To-Date
- 88.06 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 7 Age
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