Nanowire devices, systems, and methods of production
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United States of America Patent
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Jan 30, 2018
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N/A
app pub date -
Oct 21, 2016
filing date -
Oct 21, 2016
priority date (Note) -
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Abstract
A method of depositing nanowires including generating wells disposed on a patterned conductive film. The patterned conductive film includes well-sites. The patterned conducive film covers a portion of a surface of a substrate. Each of the wells is disposed proximate to a corresponding wellsite. The method includes applying a nanowire mixture to the wells and, after applying the nanowire mixture, at least one nanowire is deposited on a first portion and a second portion of the patterned conductive film by generating an electric field proximate to the patterned conductive film. The first portion and the second portion of the patterned conductive film are separated by a gap.
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