Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 30, 2018
Issued Date -
N/A
app pub date -
Jan 21, 2016
filing date -
Jan 30, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Disclosed is a substrate liquid processing apparatus including a processing liquid storage unit that stores a processing liquid; a processing liquid supply unit that supplies the processing liquid to the processing liquid storage unit; a processing liquid circulation unit that circulates the processing liquid inside the processing liquid storage unit; a processing liquid discharge unit that discharges the processing liquid; a concentration sensor that measures a concentration in the processing liquid; and a controller that controls the processing liquid supply unit. The controller controls the processing liquid circulation unit to circulate the processing liquid, the processing liquid discharge unit to discharge the circulated processing liquid intermittently at a predetermined timing or continuously for a predetermined period of time, the processing liquid supply unit to newly supply the processing liquid, and the concentration sensor to measure the concentration in the processing liquid at a predetermined timing.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2016 Application Filing Year
- H01L Class
- 27971 Applications Filed
- 23507 Patents Issued To-Date
- 84.05 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- H01L Class
- 23.71 % this patent is cited more than
- 7 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jul 30, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jul 30, 2029 |
