Deposition methods for uniform and conformal hybrid titanium oxide films
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United States of America Patent
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Jan 30, 2018
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Jun 16, 2016
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Jun 18, 2015
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Abstract
Methods for depositing titanium oxide films by atomic layer deposition are disclosed. Titanium oxide films may include a titanium nitride cap, an oxygen rich titanium nitride cap or a mixed oxide nitride layer. Also described are methods for self-aligned double patterning including titanium oxide spacer films.
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