Multi charged particle beam exposing method, and multi charged particle beam exposing apparatus
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United States of America Patent
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Jan 30, 2018
Grant Date -
Jul 20, 2017
app pub date -
Jan 13, 2017
filing date -
Jan 19, 2016
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Abstract
A multi charged particle beam exposing method includes setting, in multiple exposures by a plurality of shots of each beam of multi-beams where the plurality of shots continuously irradiate a same irradiation position, a plurality of clock periods including at least one different clock period where the plurality of clock periods individually control an irradiation time of each beam of the multi-beams such that a clock period of at least one exposure processing differs from clock periods of other exposure processing, and exposing respective corresponding irradiation positions on a target object with the multi-beams by controlling, in each exposure processing of the multiple exposures, the irradiation time in exposure processing concerned using a clock period which has been set in the plurality of clock periods including the at least one different clock period.
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