Charged particle beam device and charged particle beam device control method
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United States of America Patent
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Jan 30, 2018
Issued Date -
N/A
app pub date -
Oct 7, 2014
filing date -
Oct 8, 2013
priority date (Note) -
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Abstract
The objective of the present invention is to provide a charged particle beam device, wherein the positional relationship between reflected electron detection elements and a sample and the vacuum state of the sample surroundings are evaluated to select automatically a reflected electron detection element appropriate for acquiring an intended image. In this charged particle beam device, all the reflected electron detection elements are selected when the degree of vacuum inside the sample chamber is high and the sample is distant from the reflected electron detectors, while a reflected electron detection element appropriate for acquiring a compositional image or a height map image is selected when the degree of vacuum inside the sample chamber is high and the sample is close to the reflected electron detectors. When the degree of vacuum inside the sample chamber is low, all the reflected electron detection elements are selected.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
HITACHI HIGH-TECH CORPORATION | 17-1 TORANOMON 1-CHOME MINATO-KU TOKYO 105-6409 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Aoki, Kenji | Tokyo, JP | 186 | 2782 |
# of filed Patents : 186 Total Citations : 2782 | |||
Hosoya, Kotaro | Tokyo, JP | 10 | 51 |
# of filed Patents : 10 Total Citations : 51 | |||
Nakamura, Mitsuhiro | Tokyo, JP | 172 | 2519 |
# of filed Patents : 172 Total Citations : 2519 | |||
Saitou, Tsutomu | Tokyo, JP | 16 | 104 |
# of filed Patents : 16 Total Citations : 104 | |||
Shigeto, Kunji | Tokyo, JP | 13 | 56 |
# of filed Patents : 13 Total Citations : 56 |
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