Charged Particle Beam System With Receptacle Chamber For Cleaning Sample and Sample Stage
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United States of America Patent
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Jan 30, 2018
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N/A
app pub date -
Aug 10, 2016
filing date -
Aug 12, 2015
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Abstract
A charged particle beam system capable of reducing contamination has a sample chamber (15) in which the sample (S) is irradiated with a charged particle beam and a receptacle chamber (21) which is connected into the sample chamber (15) via an isolation valve (25) and is connected to the ambient via a door (26). A transport mechanism (22) conveys the sample (S) from the ambient via the door (26) into the receptacle chamber (21) and via the isolation valve (25) into the sample chamber (15). A cleaning portion supplies active oxygen into the receptacle chamber which can then be evacuated by a vacuum pump.
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