Verification method of mask pattern, manufacturing method of a semiconductor device and nontransitory computer readable medium storing a mask pattern verification program
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United States of America Patent
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Jan 30, 2018
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app pub date -
Dec 28, 2015
filing date -
Sep 9, 2015
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Abstract
According to one embodiment, an inscribed figure as circle or an oval inscribed in a rectangular pattern of designed layout data is calculated, a difference in area between a lithographic shape corresponding to the rectangular pattern and the inscribed figure is calculated, and it is determined whether the difference in area satisfies a predetermined specification.
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