Simulating shape of a workpiece based on a flux
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United States of America Patent
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Jan 30, 2018
Issued Date -
N/A
app pub date -
Oct 30, 2013
filing date -
Nov 7, 2012
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Abstract
A simulation method to cause an information processing device to calculate, including: reversely tracing a first flux incident on any position on a surface of a workpiece subject to processing treatment from the position; when the first flux strikes another position on the workpiece surface as a result of the reverse tracing of the first flux, calculating a second flux to be the first flux by scattering at the another position and reversely tracing the second flux from the another position; and, by repeating calculation and reverse tracing of flux, when the reversely traced flux no longer strikes the workpiece surface, carrying out comparison of the flux with an angular distribution of a flux incident on the workpiece, and when the current flux is within the angular distribution, obtaining an amount of flux having contributed to the scattering for a flux group from the first flux to the current flux.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SONY CORPORATION | TOKYO |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Kinoshita, Takashi | Kanagawa, JP | 125 | 1110 |
Kuboi, Nobuyuki | Kanagawa, JP | 31 | 168 |
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