Lithography apparatus, lithography method, lithography system, storage medium, and article manufacturing method
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United States of America Patent
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Jan 30, 2018
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app pub date -
Jul 28, 2016
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Jul 19, 2013
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Abstract
Provided is a lithography apparatus that includes a plurality of patterning devices each of which is configured to perform patterning for a substrate supplied from a preprocessing apparatus; and a controller configured to control the plurality of patterning devices such that a plurality of substrates respectively belonging to a plurality of lots is subjected to parallel processings by the plurality of patterning devices based on a plurality of recipe information respectively corresponding to the plurality of lots, and transmit information regarding a schedule of the parallel processings to the preprocessing apparatus.
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