Photo-curable and thermo-curable resin composition and dry film solder resist

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United States of America Patent

PATENT NO 9880467
SERIAL NO

14419179

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Abstract

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The present invention relates to a photo-curable and thermo-curable resin composition which can form a DFSR having micro unevenness on the surface without a separate treatment such as plasma treatment and the like and a DFSR. The photo-curable and thermo-curable resin composition includes an acid-modified oligomer having a carboxyl group (—COOH) and a photo-curable unsaturated functional group; a polyimide-based resin; a photo-polymerizable monomer having two or more photo-curable unsaturated functional groups; a thermo-curable binder having a thermo-curable functional group; and a photoinitiator.

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Patent Owner(s)

Patent OwnerAddress
LG CHEM LTDSEOUL SOUTH KEREAN SEOUL

International Classification(s)

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  • 2013 Application Filing Year
  • H01L Class
  • 22267 Applications Filed
  • 20713 Patents Issued To-Date
  • 93.03 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2013201420152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Bo Yun Daejeon, KR 8 17
Choi, Byung Ju Daejeon, KR 11 13
Jeong, Min Su Daejeon, KR 12 17
Jeong, Woo Jae Daejeon, KR 14 16
Lee, Kwang Joo Daejeon, KR 52 74

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Patent Citation Ranking

  • 1 Citation Count
  • H01L Class
  • 23.71 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3689997611243481558461392216162801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +05001000150020002500300035004000450050005500600065007000750080008500900095001000010500

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