Photoresist composition and color filter manufacturing method
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United States of America Patent
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Jan 30, 2018
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Dec 25, 2015
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Dec 8, 2015
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Abstract
The present invention provides a photoresist composition and a color filter manufacturing method. The photoresist composition of the present invention includes a first solvent, a second solvent, a photo initiator, a monomer, a polymer, an additive, and a pigment. After heating, phase separation occurs between the first solvent and the second solvent. After the phase separation, the first solvent is located above the second solvent. At least one of the photo initiator, the monomer, the polymer, and the additive has solubility in the second solvent that is higher than that in the first solvent so as to alleviate the wrinkling issue caused by different degrees of solidification between upper and lower layers of the photoresist during a manufacturing process of a color filter.
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