Photomask blank and method for preparing photomask

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United States of America Patent

PATENT NO 9880459
SERIAL NO

15206537

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Abstract

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In a photomask blank comprising a transparent substrate, a resistance layer, and a conductive layer, the resistivity and thickness of the conductive layer and the resistivity and thickness of the resistance layer are selected so as to meet a specific equation (1). In EB lithography, a ground can be established at a necessary fully low resistance value, and EB writing be carried out at a high accuracy.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukaya, Souichi Joetsu, JP 21 73
Inazuki, Yukio Joetsu, JP 113 794
Sasamoto, Kouhei Joetsu, JP 24 74

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