Array substrate, method for manufacturing the same, and display device
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United States of America Patent
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Jan 30, 2018
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app pub date -
Mar 7, 2016
filing date -
Apr 30, 2015
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Abstract
A method for manufacturing an array substrate, including steps of forming a semiconductor pattern, a gate electrode and a first insulation pattern sequentially on a base substrate at different layers, an orthogonal projection of the semiconductor pattern onto the base substrate covering an orthogonal projection of the first insulation pattern onto the base substrate, and the orthogonal projection of the first insulation pattern onto the base substrate covering an orthogonal projection of the gate electrode onto the base substrate, and subjecting the semiconductor pattern to ion implantation through a single ion implantation process using the first insulation pattern and the gate electrode as a mask plate, so as to form an active layer, a heavily-doped source electrode region, a lightly-doped source electrode region, a heavily-doped drain electrode region, and a lightly-doped drain electrode region.
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