Method and apparatus for optically checking by interferometry the thickness of an object being machined
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 30, 2018
Issued Date -
N/A
app pub date -
Jul 24, 2014
filing date -
Jul 26, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for optically checking by interferometry the thickness of an object (2) being machined comprises a phase of direct checking wherein the spectrum of the result of interference between primary reflected radiations (R1) generated by reflection of incident radiations (I) on an external surface (16) and secondary reflected radiations (R2) generated by reflection on an internal surface of discontinuity (17) of the object is analyzed, and a preliminary phase wherein information relative to the variation of a virtual thickness (D) delimited and defined by a reference surface (18) and the external surface of the object, indicative of thickness variations of the object being machined. In the preliminary phase, the processing is based on the analysis of the spectrum of the result of interference between primary reflected radiations and reference reflected radiations (Rref) generated by the reflection of the incident radiations on the reference surface, that defines the length of a reference optical path. An apparatus that implements such method for optically checking includes an optical probe (6) that receives and detects the primary, secondary and reference reflected radiations, and a spectrometer (5) that analyzes the spectrum of the result of interference.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully