Metamaterial thin films
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United States of America Patent
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Jan 30, 2018
Issued Date -
N/A
app pub date -
Mar 5, 2013
filing date -
Mar 5, 2012
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A metamaterial thin film with plasmonic properties formed by depositing metallic films by atomic layer deposition onto a substrate to form a naturally occurring mosaic-like nanostructure having two-dimensional features with air gaps between the two-dimensional features. Due to the unique deposition nanostructure, plasmonic thin films of metal or highly conducting materials can be produced on any substrate, including fabrics and biological materials. In addition, these plasmonic materials can be used in conjunction with geometric patterns that may be used to create multiple resonance plasmonic metamaterials.
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International Classification(s)
- 2013 Application Filing Year
- C23C Class
- 2155 Applications Filed
- 1819 Patents Issued To-Date
- 84.41 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- C23C Class
- 32.86 % this patent is cited more than
- 7 Age
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