Solution treatment apparatus and solution treatment method

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United States of America Patent

PATENT NO 9878267
SERIAL NO

15639010

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Abstract

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A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Furusho, Toshinobu Koshi, JP 17 137
Ichino, Katsunori Koshi, JP 16 82
Sasa, Takashi Koshi, JP 20 200
Takeguchi, Hirofumi Koshi, JP 32 294
Terashita, Yuichi Koshi, JP 23 126
Tsuchiya, Katsuhiro Tokyo, JP 21 577
Yoshihara, Kousuke Koshi, JP 113 1395

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