Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
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United States of America Patent
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Jan 30, 2018
Grant Date -
Oct 8, 2015
app pub date -
Mar 16, 2015
filing date -
Dec 19, 2003
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Abstract
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
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