Method for forming patterns and method for manufacturing magnetic memory device using the same
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United States of America Patent
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Jan 23, 2018
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app pub date -
Jun 13, 2016
filing date -
Sep 2, 2015
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Abstract
A method for forming a pattern, the method including forming an etch target layer on a substrate; patterning the etch target layer to form patterns; and performing a pre-oxidation trim process a plurality of times, the pre-oxidation trim process including performing an oxidation process to form an insulating layer on a sidewall of each of the patterns; and performing a sputter etch process to remove at least a portion of the insulating layer.
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