High-K metal-insulator-metal capacitor and method of manufacturing the same
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United States of America Patent
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Jan 23, 2018
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app pub date -
Oct 31, 2016
filing date -
Oct 31, 2016
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Abstract
A metal-insulator-metal (MIM) capacitor includes, in cross-sectional view, a first metal plate, a second metal plate, a third metal plate, and high-k material contacting the first metal plate, the second metal plate, and the third metal plate, in a manner achieved by using a single etching/mask pattern for an etching and deposition process to form the second metal plate, the third metal plate, the high-k material layer, and contact with the first metal plate.
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