Semiconductor devices and methods of manufacturing the same

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United States of America Patent

PATENT NO 9876013
SERIAL NO

15477554

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Abstract

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A semiconductor device is provided including first and second active fin arrays on a substrate. The semiconductor device further includes a pair of first gate spacers disposed on the first and second active fin arrays, each of the pair of first gate spacers including a first region having a first width, a second region having a second width, and a third region between the first region and the second region and having a third width; and first and second gate electrodes, the first gate electrode disposed between the first regions and the second gate electrode disposed between the second regions. The first regions are on the first active fin array, the second regions are on the second active fin array, and the third regions are between the first active fin array and the second active fin array. Each of the first and second widths is greater than the third width.

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Patent Owner(s)

  • SAMSUNG ELECTRONICS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hong, Seung Soo Incheon, KR 26 114
Lee, Jeong Yun Yongin-si, KR 40 249
Lim, Bo Ra Seoul, KR 5 49
Min, Kyung Seok Yongin-si, KR 11 47
Park, Seung Ju Hwaseong-si, KR 9 108
Seong, Geum Jung Seoul, KR 13 83

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