Method for producing an optoelectronic semiconductor chip
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United States of America Patent
Stats
-
Jan 23, 2018
Issued Date -
N/A
app pub date -
Mar 17, 2017
filing date -
Aug 21, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for producing an optoelectronic semiconductor chip is disclosed. In an embodiment, the method includes providing a semiconductor body with a pixel region including different subpixel regions, each subpixel region having a radiation exit face, applying an electrically conductive layer onto the radiation exit face of a subpixel region, wherein the electrically conductive layer is suitable at least in part for forming a salt with a protic reactant, and depositing a conversion layer on the electrically conductive layer using an electrophoresis process, wherein the deposited conversion layer comprises pores.
First Claim
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International Classification(s)
- 2017 Application Filing Year
- C25D Class
- 678 Applications Filed
- 418 Patents Issued To-Date
- 61.66 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- C25D Class
- 45.04 % this patent is cited more than
- 7 Age
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|---|---|---|---|---|
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