Method for removing metal contamination and apparatus for removing metal contamination

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United States of America Patent

PATENT NO 9875915
SERIAL NO

14975998

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Abstract

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Disclosed is a method for removing metal contamination present on an inner wall of a fluorine-based resin used in a chemical liquid supply line that supplies a chemical liquid to a workpiece. The method includes bringing some or all of a cleaning material reactive to a metal forming the metal contamination into a gaseous state; supplying the gaseous cleaning material to the chemical liquid supply line; and removing the metal contamination by reacting the gaseous cleaning material with the metal contamination present on the inner wall of the fluorine-based resin used in the chemical liquid supply line.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dobashi, Kazuya Yamanashi, JP 42 1046
Ito, Yudai Yamanashi, JP 5 3
Kojima, Shigeyoshi Kumamoto, JP 4 17
Nishimura, Hideki Kumamoto, JP 104 1483
Saito, Misako Yamanashi, JP 23 641

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