Generating manufacturable sub-resolution assist feature shapes from a usefulness map
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United States of America Patent
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Jan 23, 2018
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app pub date -
May 16, 2016
filing date -
May 16, 2016
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Abstract
An illustrative method includes providing a layout of at least a portion of a photomask, the layout comprising a plurality of target features, each target feature having a shape in accordance with a corresponding one of at least one target shape, for each of the target shapes, providing a local map specifying a respective value of a local sub-resolution assist feature (SRAF) usefulness for each of a plurality of positions relative to the target shape, generating a global usefulness map specifying a respective global SRAF usefulness for each of the plurality of positions relative to at least a portion of the photomask on the basis of the assignment of the values of the local SRAF usefulness.
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