Photolithographic illuminator that is telecentric in two directions
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United States of America Patent
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Jan 23, 2018
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app pub date -
Sep 25, 2013
filing date -
Sep 25, 2012
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Abstract
The invention relates to a photolithographic illumination device including: a light beam source; a condenser (5); an optical homogenizing system (4), including at least one microlens array (L3, L4), arranged upstream from the condenser (5) such that the image focal plane of the optical homogenizing system is positioned in the object focal plane of the condenser; a shutter (3), arranged in the object focal plane of the optical homogenizing system, and in which the optical homogenizing system includes two microlens arrays (L3, L4), the spacing as well as the arrangement and orientation of the microlenses of which are designed such that, in two directions (X, Y) orthogonal to the optical axis, the optical homogenizing system has merged image focal planes and merged object focal planes. The invention likewise relates to a photolithographic device including such an illuminator.
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