Pellicle for a reflective mask and reflective mask assembly including the same
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United States of America Patent
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Jan 23, 2018
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app pub date -
Jun 16, 2016
filing date -
Sep 4, 2015
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Abstract
A pellicle for a reflective mask including a pellicle body, a light shielding pattern, a grating pattern, and a pellicle frame. The pellicle body includes a central region and a peripheral region, wherein the peripheral region surrounds the central region. The light shielding pattern is formed on the peripheral region of the pellicle body; the grating pattern is formed on the light shielding pattern, and the pellicle frame is located under the peripheral region of the pellicle body, and the pellicle frame is configured to support the pellicle body.
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