Common deposition platform, processing station, and method of operation thereof

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United States of America Patent

PATENT NO 9873945
SERIAL NO

13871899

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Abstract

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An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Buschbeck, Wolfgang Hanau, DE 28 116
Dieguez-Campo, Jose Manuel Hanau, DE 40 183
Hein, Stefan Blankenbach, DE 51 329
Landgraf, Heike Bruchkobel, DE 13 56
Morrison, Neil Darmstadt, DE 34 154
Ries, Florian Westerngrund, DE 24 104
Stolley, Tobias Oberursel, DE 24 76

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