Polymer, organic layer composition, and method of forming patterns

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United States of America Patent

PATENT NO 9873815
SERIAL NO

15062233

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Abstract

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A polymer includes a first moiety represented by Chemical Formula 1, and a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof:

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG SDI CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kwon, Hyo Young Suwon-si, KR 5 16
Mun, Soohyoun Suwon-si, KR 2 9
Nam, Younhee Suwon-si, KR 7 13
Namgung, Ran Suwon-si, KR 31 74
Song, Hyunji Suwon-si, KR 20 19

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