Fluorenyl β-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same

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United States of America Patent

PATENT NO 9873663
SERIAL NO

15112087

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Abstract

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The present invention relates to a novel β-oximester fluorene derivative compound, a photopolymerization initiator comprising the same, and a photoresist composition.

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Patent Owner(s)

Patent OwnerAddress
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY141 GAJEONG-RO YUSEONG-GU DAEJEON 34114
SAMYANG CORPORATION31 JONG-RO 33-GIL JONGNO-GU SEOUL 03129 03129

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Yong-Il Gyeonggi-si, KR 10 102
Jun, Kun Daejeon, KR 7 25
Lee, Min-Sun Seoul, KR 16 269
Lee, Sang-Oh Mokpo-si, KR 31 248
Lee, Won-Jung Daejeon, KR 1 7
Oh, Chun-Rim Seoul, KR 2 7
Shin, Jong-Il Daejeon, KR 3 13
Shin, Seung-Rim Daejeon, KR 1 7

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