Monitoring system for deposition and method of operation thereof

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United States of America Patent

PATENT NO 9870935
SERIAL NO

14839656

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Abstract

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A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition.

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Patent Owner(s)

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APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Budiarto, Edward W Fremont, US 18 79
Egan, Todd Fremont, US 58 521
Foad, Majeed A Sunnyvale, US 71 2156
Hofmann, Ralf Soquel, US 67 1804
Nowak, Thomas Cupertino, US 95 10168
Vaez-Iravani, Mehdi Los Gatos, US 126 2380

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