Method of producing processing condition of plasma processing apparatus, and plasma processing apparatus
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United States of America Patent
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Jan 16, 2018
Issued Date -
N/A
app pub date -
May 4, 2016
filing date -
May 7, 2015
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Disclosed is a method of producing a processing condition of a plasma processing apparatus. The method includes producing a plurality of processing conditions having different processing parameters, which are applied to an intermediate process performed between an ignition process that ignites plasma of a processing gas using a high frequency wave and a processing process that processes a workpiece by the plasma; sequentially performing the ignition process, the intermediate process applied with each of the processing conditions, and the processing process; measuring, when the intermediated process is changed to the processing process, a power of a reflected wave of the high frequency wave during the processing process in association with each of the processing conditions; and selecting, among the plurality of processing conditions, a processing condition in which the power of the reflected wave of the high frequency wave is minimized.
First Claim
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Family
| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| JP | B2 | JP6479562 | May 07, 2015 |
| KR | B1 | KR102412248 | Apr 26, 2016 |
| TW | A | TW201643933 | Apr 27, 2016 |
International Classification(s)
- 2016 Application Filing Year
- H01J Class
- 2255 Applications Filed
- 1758 Patents Issued To-Date
- 77.97 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01J Class
- 0 % this patent is cited more than
- 7 Age
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