Methods for perforating two-dimensional materials using a broad ion field

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United States of America Patent

PATENT NO 9870895
SERIAL NO

14610770

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Abstract

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Perforating graphene and other two-dimensional materials with holes inclusively having a desired size range, a narrow size distribution, and a high hole density can be difficult to achieve. A layer in continuous contact with graphene, graphene-based materials and other two-dimensional materials can help promote hole formation. Processes for perforating a two-dimensional material can include exposing to an ion source a two-dimensional material in continuous contact with at least one layer, and interacting a plurality of ions from the ion source with the two-dimensional material and with the at least one layer. The ion source may be a broad ion beam.

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Patent Owner(s)

Patent OwnerAddress
LOCKHEED MARTIN CORPORATION6560 ROCKLEDGE DRIVE BETHESDA MD 20817

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bedworth, Peter V Los Gatos, US 41 1187

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