Detection apparatus, measurement apparatus, lithography apparatus, and method of manufacturing article
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United States of America Patent
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Jan 16, 2018
Grant Date -
Nov 3, 2016
app pub date -
Apr 15, 2016
filing date -
Apr 30, 2015
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Abstract
The present invention provides a detection apparatus which causes light to be incident obliquely on a substrate including a plurality of layers whose refractive indices are different from each other and detects a height of the substrate using light reflected from the substrate, the apparatus comprising an optical system including a polarizer for reducing s-polarized light and configured to cause light, in which s-polarized light has been reduced by the polarizer, to be incident on the substrate at an angle of incidence within a range of 40° to 55°.
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