Collector in an extreme ultraviolet lithography system with optimal air curtain protection
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United States of America Patent
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Jan 16, 2018
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app pub date -
Jun 27, 2016
filing date -
Mar 13, 2014
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Abstract
The present disclosure provides an extreme ultraviolet (EUV) lithography system. The EUV lithography system includes a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module. The gas pipeline includes inward and outward entrances into the collector. The inward and outward entrances are configured and operable to form a gas curtain on the coating surface of the collector.
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