Collector in an extreme ultraviolet lithography system with optimal air curtain protection
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United States of America Patent
Stats
-
Jan 16, 2018
Issued Date -
N/A
app pub date -
Jun 27, 2016
filing date -
Mar 13, 2014
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present disclosure provides an extreme ultraviolet (EUV) lithography system. The EUV lithography system includes a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module. The gas pipeline includes inward and outward entrances into the collector. The inward and outward entrances are configured and operable to form a gas curtain on the coating surface of the collector.
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Cited Art Landscape
Patent Citation Ranking
- 118 Citation Count
- G03B Class
- 99.48 % this patent is cited more than
- 7 Age
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| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jul 16, 2025 |
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