Resin, resist composition and method for producing resist pattern

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United States of America Patent

PATENT NO 9869929
APP PUB NO 20160077429A1
SERIAL NO

14854830

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Abstract

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A resist composition include (A1) a resin which includes a structural unit represented by formula (a4), and which resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator,

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO CHEMICAL COMPANY LIMITED2-7-1 NIHONBASHI CHUO-KU TOKYO 103-6020

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ichikawa, Koji Osaka, JP 316 1995
Masuyama, Tatsuro Osaka, JP 69 357
Suzuki, Yuki Osaka, JP 132 230

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