Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
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United States of America Patent
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Jan 16, 2018
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N/A
app pub date -
Apr 11, 2016
filing date -
Mar 15, 2013
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Abstract
Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A planarized process is provided to remove the absorber layer above the top surface of the hard mask layer and form an absorber in the opening, wherein the absorber has a top portion wider than a bottom portion.
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