Ion assisted deposition for rare-earth oxide based coatings
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United States of America Patent
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Jan 16, 2018
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app pub date -
Jan 23, 2017
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Jul 20, 2013
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Abstract
A method of manufacturing an article comprises performing ion assisted deposition (IAD) to deposit a protective layer on at least one surface of the article, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less.
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