Curable composition for imprints, patterning method and pattern

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United States of America Patent

PATENT NO 9868846
SERIAL NO

14151367

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Abstract

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Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A);

    a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Enomoto, Yuichiro Haibara-gun, JP 38 367
Kitagawa, Hirotaka Haibara-gun, JP 43 252
Kodama, Kunihiko Haibara-gun, JP 164 2265
Omatsu, Tadashi Haibara-gun, JP 61 370
Usuki, Kazuyuki Haibara-gun, JP 42 289

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