Electronic device and method for fabricating the same

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United States of America Patent

PATENT NO 9865806
SERIAL NO

15354365

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Abstract

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Electronic devices and systems having semiconductor memory are provided. In one implementation, for example, an electronic device may include a substrate; an under layer disposed over the substrate and including conductive hafnium silicate; a free layer disposed over the under layer and having a variable magnetization direction; a tunnel barrier layer disposed over the free layer; and a pinned layer disposed over the tunnel barrier layer and having a pinned magnetization direction, and wherein the free layer includes: a first ferromagnetic material; a second ferromagnetic material having a coercive force smaller than that of the first ferromagnetic material; and an amorphous spacer interposed between the first ferromagnetic material and the second ferromagnetic material.

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Patent Owner(s)

Patent OwnerAddress
SK HYNIX INCGYEONGGI DO SOUTH KOREA GYEONGGI-DO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Won-Joon Icheon-si, KR 88 1588
Dong, Cha-Deok Icheon-si, KR 21 303
Kim, Choi-Dong Icheon-si, KR 7 239
Kim, Guk-Cheon Icheon-si, KR 33 345
Kim, Jae-Heon Icheon-si, KR 13 262
Kim, Jae-Hong Icheon-si, KR 196 1682
Kim, Jeong-Myeong Icheon-si, KR 19 171
Kim, Yang-Kon Icheon-si, KR 30 312
Lee, Bo-Mi Icheon-si, KR 34 599
Lee, Min-Suk Icheon-si, KR 62 837
Lim, Jong-Koo Icheon-si, KR 25 270
Noh, Seung-Mo Icheon-si, KR 10 226
Park, Chan-Sik Icheon-si, KR 33 554
Park, Ki-Seon Icheon-si, KR 46 514

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