System and method for a vertical tunneling field-effect transistor cell
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United States of America Patent
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Jan 9, 2018
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app pub date -
Aug 24, 2012
filing date -
Aug 24, 2012
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Abstract
A semiconductor device cell is disclosed. The semiconductor device cell includes a transistor gate having a gating surface and a contacting surface and a source region contacted by a source contact. The semiconductor device cell further includes a drain region contacted by a drain contact, wherein the drain contact is not situated opposite the source contact with respect to the gating surface of the transistor gate. Additional semiconductor device cells in which the gate contact is closer to the source contact than to the drain contact are disclosed.
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