Array substrate and manufacturing method thereof

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United States of America Patent

PATENT NO 9865619
SERIAL NO

14779545

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Abstract

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An array substrate and a manufacturing method thereof are provided. The method has steps of: forming a buffer layer, a light-shading layer, and a whole semiconductor layer on a substrate; simultaneously patterning the semiconductor layer and the light-shading layer; and forming a first insulation layer, a first metal layer, a second insulation layer, a second metal layer, a flat layer, and a first transparent conductive layer on the patterned semiconductor layer.

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Patent Owner(s)

Patent OwnerAddress
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTDNO 9-2 TANGMING RD GUANGMING NEW DISTRICT SHENZHEN GUANGDONG 518132

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Du, Peng Guangdong, CN 183 502
Wang, Cong Guangdong, CN 208 651
Wang, Xiaoxiao Guangdong, CN 49 193

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