Interconnect structure with misaligned metal lines coupled using different interconnect layer
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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Jan 9, 2018
Issued Date -
N/A
app pub date -
Jan 18, 2017
filing date -
Dec 26, 2014
priority date (Note) -
In Force
status (Latency Note)
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Abstract
In some embodiments, an interconnect structure includes first and second metal lines, and an end-to-end portion. The first metal line is formed in a first interconnect layer, extends in length substantially along a first direction and ends at a first end portion. The second metal line is formed in the first interconnect layer, starts from a second end portion, extends in length substantially along the first direction and is misaligned with the first metal line in the first direction. The end-to-end portion couples the first metal line to the second metal line, is formed in a second interconnect layer different from the first interconnect layer, and is overlapped with the first and second end portions. A width of the end-to-end portion at where the end-to-end portion is overlapped with the first end portion is wider than a width of the first end portion by at least about 10%.
First Claim
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Family
Country | kind | publication No. | Filing Date | Type | Sub-Type |
---|---|---|---|---|---|
US | B2 | US9583438 | Dec 22, 2015 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT AS SECOND PUBLICATION | Interconnect structure with misaligned metal lines coupled using different interconnect layer | Feb 28, 2017 | |||
DE | B4 | DE102015122667 | Dec 23, 2015 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
PATENT (SECOND PUBLICATION) | VERBINDUNGSSTRUKTUR MIT NICHTFLUCHTENDEN METALLLEITUNGEN, DIE DURCH EINE ANDERE VERBINDUNGSSCHICHT VERBUNDEN SIND | Oct 01, 2020 | |||
TW | B | TWI600142 | Dec 24, 2015 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT OR PATENT OF ADDITION | Interconnect structure with misaligned metal lines coupled using different interconnect layer | Sep 21, 2017 | |||
KR | B1 | KR101780872 | Dec 24, 2015 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
PATENT SPECIFICATION | 오정렬된 금속 라인이 상이한 인터커넥트 층을 사용하여 커플링되는 인터커넥트 구조체 | Sep 22, 2017 | |||
CN | B | CN105762110 | Dec 28, 2015 | Patent | Grant |
Type : Patent Sub-Type : Grant | |||||
GRANTED PATENT FOR INVENTION | Interconnect structure, semiconductor chip and layout with misaligned metal lines coupled using different interconnect layers | Jun 21, 2019 |
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD | 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78 |
International Classification(s)

- 2017 Application Filing Year
- H01L Class
- 30754 Applications Filed
- 25260 Patents Issued To-Date
- 82.14 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Chen, Yen-Huei | Hsinchu County, TW | 294 | 1754 |
# of filed Patents : 294 Total Citations : 1754 | |||
Liaw, Jhon Jhy | Hsinchu County, TW | 583 | 5922 |
# of filed Patents : 583 Total Citations : 5922 |
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Patent Citation Ranking
- 30 Citation Count
- H01L Class
- 95.06 % this patent is cited more than
- 7 Age
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