Fabrication of a silicon structure and deep silicon etch with profile control

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9865472
SERIAL NO

15134144

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A method of etching features into a silicon layer with a steady-state gas flow is provided. An etch gas comprising an oxygen containing gas and a fluorine containing gas is provided. A plasma is provided from the etch gas. Then, the flow of the etch gas is stopped.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bogart, Jeff Campbell, US 3 82
Chebi, Robert San Carlos, US 15 973
Chen, Wan-Lin Cupertino, US 15 73
Lassig, Stephan Danville, US 5 40
Lin, Frank Fremont, US 78 826
Moore, Erin Newark, US 3 20
Rusu, Camelia Fremont, US 18 365
Winniczek, Jaroslaw W Daly City, US 24 1936
Zheng, Lily Fremont, US 4 42

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Jul 9, 2025
11.5 Year Payment $7400.00 $3700.00 $1850.00 Jul 9, 2029
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00