Plasma treatment to improve adhesion between hardmask film and silicon oxide film
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United States of America Patent
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Jan 9, 2018
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app pub date -
Apr 8, 2016
filing date -
Apr 22, 2015
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Abstract
The present disclosure relates to methods for improving adhesion between a hardmask layer and a subsequent layer on the hardmask layer. Particularly, embodiment of the present disclosure relates to methods for improving adhesion between a metal-doped amorphous carbon layer and a mask layer, such as a silicon oxide layer, a silicon nitride layer, or an amorphous silicon layer. One embodiment of the present disclosure includes performing a plasma treatment to the metal-doped amorphous carbon layer.
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